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Pamarco GmbH will showcase its latest innovations in anilox technology and surface engineering

Visit Pamarco at Labelexpo 2025 to discover how innovation, reliability, and proven performance come together to drive better print outcomes.

TSL Anilox
Publié 08/08/2025 - 15:33

At Labelexpo 2025, Pamarco GmbH will showcase its latest innovations in anilox technology and surface engineering, designed to enhance print performance, reduce downtime, and meet the evolving demands of the label and narrow web industry. A key highlight will be Terolux, Pamarco’s next-generation coating. Developed with advanced material science, Terolux offers exceptional durability, superior ink release, and high-definition print performance, even under demanding production conditions. It represents a significant leap forward in achieving consistent, high-quality results across both UV and water-based applications.

Alongside Terolux, Pamarco will present its full range of precision-engineered anilox rollers, manufactured using proprietary laser engraving techniques that ensure consistent cell geometry and volume. These rollers are designed to meet the rigorous standards of today’s converters, offering long-term reliability and exceptional print consistency.

Visitors will also learn about Pamarco’s tailored cleaning solutions and roller maintenance programmes, developed to help printers maintain optimal performance while extending the life of their anilox inventory. With a strong focus on sustainability, efficiency, and technical support, Pamarco continues to be a trusted partner to the label printing industry.

Visit Pamarco at Labelexpo 2025 to discover how innovation, reliability, and proven performance come together to drive better print outcomes.

"With Terolux, we're setting a new benchmark in coating performance. Designed to withstand the toughest production environments, Terolux delivers consistent print quality, extended roller life, and reduced downtime—helping converters stay competitive in a fast-moving market."

– Pamarco GmbH


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